Recent progress in regulating of zeolite-based catalysts by atomic layer deposition technology
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摘要: 分子筛基催化剂在多相催化研究领域具有重要的应用，但调控活性中心粒子的结构及其在分子筛上的空间位置仍比较困难，是科研界和工业界共同面临的巨大挑战。原子层沉积(ALD)是一种先进的薄膜沉积技术，利用其自限制生长优势，可在原子级别实现对金属粒子生长过程的精准调控。本工作综述了ALD技术在制备分子筛基催化剂方面的应用，主要包括利用ALD技术控制活性位点在分子筛上的生长落位、修饰分子筛骨架结构以及选择性沉积膜调变分子筛表面结构。利用ALD技术设计和调控活性组分结构促进了分子筛基催化剂的发展，但由于分子筛孔道结构复杂且存在缺陷位，因此，ALD技术在分子筛基催化剂的设计调控及大规模应用方面仍具有挑战性，也是今后研究工作的重点。Abstract: Zeolite-based catalysts have been widely used in the field of heterogeneous catalysis, but it is still difficult to control the structure and location of active sites on zeolite, which also confronts with great challenge both from academia and industry. Atomic layer deposition (ALD) is an advanced thin film deposition technique, owing to its advantages of self-limiting surface reactions, which can precisely tailor the growth process of metallic particles in atomic scale. In this review, we present a comprehensive summary of regulating the location of active sites on zeolite, modifying the framework structure and regioselective depositing of metal on special sites to engineering the surface structures of zeolites via ALD method. The design and regulation the structures of active component by ALD technology are beneficial to the development of zeolite-based catalysts. However, due to the complex of zeolite channels and the existence of defects, it is still challenging for the ALD technology to design, regulate and apply with large-scale for zeolite-based catalysts, and it will be the focus in the future research.
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Key words:
- zeolite /
- atomic layer deposition /
- catalyst /
- regulation /
- selectivity deposition
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