Effect of glow discharge plasma treatment on the performance of Ni/SiO2 catalyst in CO2 methanation
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摘要: 采用浸渍法制备了Ni/SiO2催化剂,应用等离子体技术对催化剂进行改性处理。以CO2甲烷化为模型反应对催化剂进行活性评价,通过H2程序升温还原(H2-TPR)和CO2程序升温脱附(CO2-TPD)技术对催化剂进行表征。研究了等离子体技术强化处理对催化剂吸附性能和还原性能的影响。结果表明,与常规焙烧的催化剂相比,等离子体技术改性处理提高了催化剂活性组分的分散度,增加反应活性位并调变了活性位对吸附物种的吸附强度,改进了催化剂的还原性能,CO2甲烷化反应活性和甲烷的时空产率显著提高。
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关键词:
- 射频等离子体 /
- Ni/SiO2催化剂 /
- 催化性能 /
- 二氧化碳 /
- 甲烷化
Abstract: Ni/SiO2 catalysts were prepared by impregnation method and treated by glow discharge plasma. The Ni/SiO2 catalysts were characterized by CO2-TPD and H2-TPR; the effects of plasma treatment on the performances of Ni/SiO2 in adsorption, reduction, and catalytic methanation of CO2 were investigated. The results showed that the plasma treatment can remarkably improve the dispersion of active components and enhance the reactivity of Ni/SiO2 catalyst. The catalytic performance of Ni/SiO2 in CO2 methanation is also enhanced by the plasma treatment; the conversion of CO2 and the space time yield of CH4 over the plasma modified catalyst are higher than those over the Ni/SiO2 catalyst obtained through conventional impregnation and calcination method.-
Key words:
- glow discharge plasma /
- Ni/SiO2 /
- catalytic performance /
- carbon dioxide /
- methanation.
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