Abstract: Zeolite-based catalysts have been widely used in the field of heterogeneous catalysis, but it is still difficult to control the structure and location of active sites on zeolite, which also confronts with great challenge both from academia and industry. Atomic layer deposition (ALD) is an advanced thin film deposition technique, owing to its advantages of self-limiting surface reactions, which can precisely tailor the growth process of metallic particles in atomic scale. In this review, we present a comprehensive summary of regulating the location of active sites on zeolite, modifying the framework structure and regioselective depositing of metal on special sites to engineering the surface structures of zeolites via ALD method. The design and regulation the structures of active component by ALD technology are beneficial to the development of zeolite-based catalysts. However, due to the complex of zeolite channels and the existence of defects, it is still challenging for the ALD technology to design, regulate and apply with large-scale for zeolite-based catalysts, and it will be the focus in the future research.