Abstract: Nanocatalysis is facing a technological revolution, which puts forward higher requirements for the accurate control of the size distribution and morphology of metal nanoparticles. Atomic layer deposition (ALD) is proposed as solution to this problem because of its character of accurate controlling metal distribution on atomic level. In this review, the development history, deposition mechanism as well as equipment and technology are summarized. Subsequently, the substrate types and microstructure of obtained catalysts are discussed. In particular, the latest progress of the synthesis and application of metal catalysts prepared by ALD are highlighted. Lastly, the challenges and prospects in ALD are illustrated.