卤素原子对卤氧化铋(BiOXX = Cl、Br、I)光催化性能的影响

Effect of halogen atoms on photocatalytic activity of bismuth oxyhalide (BIOX, X = Cl, Br, I)

  • 摘要: 利用水热法和溶剂热法制备了BiOCl、BiOBr和BiOI三种光催化剂,通过XRD、SEM、光电流密度与UV-vis DRS表征了光催化剂的晶体结构、表面形貌与光电性能,DFT计算结果表明,随着卤素原子序数升高,光催化剂导带附近的费米能级的分散度降低,禁带宽度变小。在可见光照射下,通过水溶液中罗丹明B的降解效果来评价光催化剂的光催化活性,BiOI具有最好的光催化活性,60 min内,罗丹明B的降解效率达到100%,同时通过自由基捕获实验探究了卤氧化铋光催化降解过程的主要活性基团。

     

    Abstract: BiOCl, BiOBr and BiOI were prepared by hydrothermal and solvothermal methods. XRD, SEM, photocurrent density curve and UV-vis were used to characterize the crystal structure, surface morphology and photoelectric properties. The band structure and density of states of BiOX were calculated by DFT. With the atomic number of halogen increase, the dispersion of the Fermi level near the semiconductor conduction band decreases, and the band gap becomes smaller. The photocatalytic activity of BiOCl, BiOBr and BiOI was evaluated by photocatalytic degradation of Rhodamine B (RhB), and the degradation rate of RhB in 60 min for BiOI could reach 100%. Meanwhile, the main active groups in the process of photocatalytic degradation of RhB were explored by radical trapping experiment.

     

/

返回文章
返回